China Suppliers best quality Omnicat 550 CAS 591773-92-1 with cheap price CAS NO.591773-92-1

Professional supplier Omnicat 550 CAS 591773-92-1 with superior quality

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Wuhan Fortuna Chemical Co.,Ltd established in 2006, is a big integrative chemical enterprise being engaged in Pharmaceutical & its intermediates, Food/Feed additives, Fine chemicals in distributing the products of our own company and affiliated enterprises, are the members of Hubei E-commerce Chamber.

Our company has professional persons who major in chemical R&D and sicentific management, supply fine chemical products with high quality and close service, also supply custom-tailored products according to our clients’ requirement.

We have a positive and self-motivated management work team with a common philosophy, caring and commitment through teamwork, our team strive to achieve success in delighting our clients and ourselves. 

Since Wuhan Fortuna Chemical Co., Ltd founded, we continuously innovate our products and improve our service, sales network. Hence, we initiate the first sale mode on net in China, which is the retail trade of small package bring along wholesale of diversified management modes. Our products are exported widely to South Korea, Vietnam, Australia, Europe and South America, highly recommended by our clients.

We insist on the management creed “Market is our compass, Quality is our life, Credit is our soul”. Clients’ trust is our forward powder, their satisfaction is our struggling goal.

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10-(4-Biphenylyl)-2-isopropylthioxanthen-10-ium Hexafluorophosphate is a specialized photoacid generator (PAG) primarily used in semiconductor lithography. Below is a structured overview of its key features:

Chemical Structure

1. Cationic Core:

   • Thioxanthenium sulfonium group: A sulfur-containing heterocyclic system (thioxanthene backbone) with photosensitivity.

   • Substituents:

     • Position 10: A 4-biphenylyl group, enhancing light absorption efficiency and etching resistance.

     • Position 2: An isopropyl group (1-methylethyl) to improve solubility and thermal stability.

2. Counterion: Hexafluorophosphate (PF??), a weakly coordinating anion that stabilizes the cation and ensures solvent compatibility.

Functional Properties

Photoacid Generation: Releases strong acids (e.g., H?) upon exposure to ultraviolet (UV) or extreme ultraviolet (EUV) light, enabling chemical amplification in photoresists for high-resolution patterning.

Optical Optimization: The biphenyl group extends conjugation, enhancing sensitivity to specific wavelengths (e.g., 248 nm, 193 nm).

Thermal Stability: The rigid biphenyl and isopropyl groups ensure durability under high-temperature semiconductor processing.

Applications

Semiconductor Lithography: Critical in advanced photoresist formulations (e.g., 7 nm, 5 nm nodes) for micro/nanoscale chip fabrication.

Electronic Materials: Used in display panels, MEMS, and other lithography-dependent technologies.

Research: Studied as a model compound for photochemical reactions.

Safety & Handling

Light Sensitivity: Requires storage in dark, cool conditions (e.g., amber glass).

Decomposition Risk: May release hydrogen fluoride (HF) under heat or acidic conditions; strict PPE and ventilation are mandatory.

Toxicity: The organic cation may cause irritation; avoid direct contact.

Commercial & Research Context

Suppliers: Custom-synthesized by specialty chemical firms (e.g., Tokyo Ohka Kogyo, Merck).

Innovation: Continuously optimized for higher resolution and sensitivity, driven by EUV lithography advancements.

Summary

This compound exemplifies precision molecular engineering, balancing photosensitivity, thermal stability, and process compatibility. Its tailored structure—featuring a biphenyl-enhanced thioxanthenium core and PF?? counterion—makes it indispensable in cutting-edge semiconductor manufacturing, highlighting the critical role of functional chemistry in microelectronics.